Global High-k and ALD/CVD Metal Precursors Market Opportunities, Future Trends, Business Demand and Growth Forecast 2030

High-k and ALD/CVD Metal Precursors Market is expected to grow at a CAGR of 6.23% during the forecast period and it is expected to reach US$ 9.11 Mn. by 2030. One of the subclasses of Chemical Vapor Deposition (CVD) process is Atomic Layer Deposition (ALD) which is used for manufacturing of thin films. ALD method is applied for depositing multi-component thin films by co-injecting precursors, such as Hf and Si. With the ALD process, it can create metal, as well as dielectric, films based on the precursor requirements. High-k and ALD/CVD metal precursors are used for very critical role in very large-scale integration (VLSI) technology for maintaining the capacitance of smaller semiconductors devices.